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Applications:
Semiconductor fabs require ultra-clean, dry air for lithography, wafer cleaning, and cleanroom environments. Even trace oil or moisture can cause microchip defects, making oil-free compressors indispensable.
Technical Advantages:
HEPA Filtration: Removes 99.97% of particles ≥0.3 µm.
Molecular Sieve Dryers: Achieve dew points as low as -70°C to prevent oxidation.
Vibration-Free Design: Protects precision equipment with vibration levels <2.5 mm/s.
Key Use Cases:
Air supply for etching and deposition tools.
Nitrogen generation for inert gas environments.
